The FloTron™ is a high-speed multi-channel active feedback process monitoring and control system designed for real time, in-situ control of low temperature plasma-based process. For example Reactive Magnetron Sputtering, Ion & Plasma processing, Reactive Electron Beam (EB) evaporation, Plasma Enhanced Chemical Vapour Deposition (PECVD), Plasma Etching.
The FloTron™ is a compact, complete, flexible and economical solution, which is convenient to use and can be readily integrated into new as well as existing vacuum systems.
- FloTron™ system types
- FloTron™ system sizes
- Why FloTron™?
- What FloTron™ can do for your process?
- More FloTron™ advantages
The following four families of FloTron™ systems are available:
a multi-channel process control system featuring optical monitoring using a photo-diode with a narrow bandpass filter and analog/digital voltage sensor inputs and actuator outputs.
- FloTron™ X
a multi-channel process control system featuring optical monitoring using a CCD spectrometer and analog/digital voltage sensor inputs and actuator outputs.
- FloTron™ H
a multi-channel process control system which allows having both monitoring technologies, i.e. a photo-diode with a narrow bandpass filter and a fast CCD spectrometer, in one compact unit.
- FloTron™ I
Any FloTron™ system can be configured flexibly in terms of sensor inputs to suit different application requirements.
FloTron™ systems are available in three sizes - 3, 5 and 9 channel. Each channel can be used to control an actuator, such as Mass Flow Controller or a power supply.
- Rugged and compact design
FloTron™ systems are reliable and robust. Thus minimal or no technical support/service required. Hardware and software developed for real industrial environments and processes.
- Industrial communication interfaces
In addition to standard Ethernet and 4-wire RS485, well documented industrial interfaces for OEMs are available on all FloTron™ systems. PROFIBUS, PROFINET, Ethernet/IP, etc.
- Automation of process set-up
Built-in automation routines to save time during process set-up.
- Process support
Process know-how, expertise and training is available to you at every stage including remote and on-site support.
- Clean User Interface and easy to tune process control algorithms with as little as two coeficients
- High accuracy process control
provides required levels of stability and process-to-process repeatability. Especially useful in Reactive Magnetron Sputtering or any other processes prone to non-linear changes and drifts.
- Process and plasma monitoring
Plasma based Physical Vapour deposition (Magnetron Sputtering, Electron Beam and Cathodic Arc Evaporation), Plasma Enhanced Chemical Vapour Deposition, Plasma Etching, etc.
- Increase production rate
2-4 times typical for most materials in Reactive Magnetron Sputtering.
- Improve plant economy
Sputter target lifetime -> less frequent target change, more coating produced from the same target volume (e.g. Si ...). Return of Investment (RoI) on a FloTron™ system is typically
- Improve coating uniformity
Large area in-line or R2R web coating.
- Log process data and replay logged data
All logged process data can be replayed using a FloTron™ Player for off-line process analysis and troubleshooting.
- Improve dramatically coating physical properties
- Help reduce arcing and macro and micro defects
- 7+ models
7+ models to suit any industrial process or R&D application requirement.
- from SMALL to LARGE
3, 5 and 9 channel FloTron™ systems to cover any system size or number of processes. Up to 7-zone reactive gas control is possible using just one FloTron™ system.
- Economical 3-zone processing
5-channel FloTron™ systems are perfect for most 3 –zone processing needs.
- Fast proprietary control algorithms
PID and PDF. PID-based algorithm – covers 99% of control engineers thus eliminating or reducing significantly the learning curve. PDF-based algorithm – offers unique performance. Both are easy to tune.
- Robust and reliable sensor assemblies
Standard optical plasma monitoring assemblies (OA-01), bespoke optical plasma monitoring assemblies. Remote Plasma sensor head (RP-01) for (reactive) gas p.p. monitoring (e.g. nitrogen, oxygen, hydrogen). RP-01 features robust design and fully integratetion with FloTron™.
- Longer life of components
Longer life of components is ensured by proprietary built-in system health check routines.
- Choice of optical monitor head designs
3 options for PVD and a design for PECVD.
- HIPIMS P.E.M. sensor
Unique intelligent design providing excellent signal for a wide range of HIPIMS pulse frequencies. Will deal comfortably with pulses coming in at irregular intervals.
- Software libraries
JAVA and .Net DLL libraries.